vacuum chemical vapor deposition meaning in English
真空化学汽相淀积
Examples
- Vacuum chemical vapor deposition
真空化学汽相淀积 - A ) si thin film with sub - micro thickness was epitaxial grown on heavy - doped si substrate by ultra high vacuum chemical vapor deposition ( uhv - cvd )
A )利用超高真空化学气相沉积( uhv - cvd )技术在重掺si衬底上生长高晶体质量的亚微米级薄硅外延片。 - Sige simox ; 3 . sige smart - cut and behavior of sige / si he terostructure implanted with hydrogen . sige film preparation : sige films were grown on silicon substrate using solid source molecular beam epitaxy ( ssmbe ) , gas - solid source molecular beam epitaxy ( gsmbe ) and ultra high vacuum chemical vapor deposition ( uhvcvd ) technologies
Sige薄膜生长方面：在熟悉各种薄膜外延技术的基础上，采用了近年来发展较为成熟的固态源分子束外延( ssmbe ) 、气-固态源分子束外延( gsmbe ) 、超高真空化学气相淀积( uhvcvd )三种sige薄膜外延技术，在硅( 100 )衬底上外延生长了sige薄膜。